| Typical Purity: |
99.99% |
| Product Type: |
Tablets/White & Black - High Laser Damage Threshold |
| Refractive Index: |
2.1 at 500nm |
| Transmission Range: |
350 - 8000nm |
| Evaporation Temperature: |
1950 ºC |
| Evaporation Source: |
Tantalum or graphite liner with electron-beam evaporation. 0.5nm/sec is a typical deposition rate for good crystallinity at a 300oC substrate temperature. As with all oxides that lose oxygen during the heat-up step, preconditioning is to be recommended. This requires a slow sweep of the e-beam over the tablets so that melting and loss of oxygen is controlled. |
| Application: |
A high index coating material, with transmission from the near ultra-violet to the infrared, (8um). Due to its refractive index being < 2 it is well suited for HL multilayer coatings in conjunction with silicon dioxide for laser applications. This oxide also finds applications in electronics Special mixtures containing tantalum oxide can be custom synthesized. |
