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Tantalum Pentoxide

Item Number
CAS Registry Number
Purity (%)
Refractive Index
2.1 at 500nm
Transmission Range
350 - 8000nm
Evaporation Temperature
1950 ÂșC
Evaporation Source
Tantalum or graphite liner with electron-beam evaporation. 0.5nm/sec is a typical deposition rate for good crystallinity at a 300oC substrate temperature. As with all oxides that lose oxygen during the heat-up step, preconditioning is to be recommended. This requires a slow sweep of the e-beam over the tablets so that melting and loss of oxygen is controlled.
A high index coating material, with transmission from the near ultra-violet to the infrared, (8um). Due to its refractive index being < 2 it is well suited for HL multilayer coatings in conjunction with silicon dioxide for laser applications. This oxide also finds applications in electronics Special mixtures containing tantalum oxide can be custom synthesized.
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